검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Full-field exposure performance of electron projection lithography tool Suzuki K, Hirayanagi N, Fujiwara T, Yamada A, Ikeda J, Yahiro T, Kojima S, Udagawa J, Yamamoto H, Katakura N, Suzuki M, Aoyama T, Takekoshi H, Umemoto T, Shimizu H, Fukui S, Suzuki S, Okino T, Ohkubo Y, Shimoda T, Tanida T, Watanabe Y, Kohama Y, Ohmori K, Mori F, Takemoto S, Yoshioka T, Hirose H, Morita K, Hada K, Kawata S, Kakizaki Y, Miura T Journal of Vacuum Science & Technology B, 22(6), 2885, 2004 |
| 2 |
Stencil reticle inspection using a deep ultraviolet microscope Okada M, Katakura N, Kawata S Journal of Vacuum Science & Technology B, 20(6), 3025, 2002 |
| 3 |
Experimental study of electron beam projection lithography mask defect printability Kojima Y, Katakura N, Tomo Y, Takenaka H, Yoshida A, Shimizu I, Yamabe M Journal of Vacuum Science & Technology B, 19(6), 2474, 2001 |
| 4 |
Improvement of soft ground using solidified coal ash and its effects on the marine environment Kimura M, Nishizawa T, Kotera H, Katakura N Journal of Hazardous Materials, 76(2-3), 285, 2000 |
| 5 |
Stencil reticle development for electron beam projection system Kawata S, Katakura N, Takahashi S, Uchikawa K Journal of Vacuum Science & Technology B, 17(6), 2864, 1999 |
| 6 |
Pattern displacement measurements for Si stencil reticles Uchikawa K, Takahashi S, Katakura N, Oshino T, Kawata S, Yamaguchi T Journal of Vacuum Science & Technology B, 17(6), 2868, 1999 |