검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films Park MH, Lee YH, Kim HJ, Kim YJ, Moon T, Do Kim K, Muller J, Kersch A, Schroeder U, Mikolajick T, Hwang CS Advanced Materials, 27(11), 1811, 2015 |
| 2 |
Determination of Ti+-flux and Ar+-flux of ionized physical vapor deposition of titanium from multiscale model calibration with test structures Jacobs W, Kersch A, Ruf A, Urbansky N Journal of Vacuum Science & Technology A, 21(4), 922, 2003 |
| 3 |
Atomistic feature scale modeling of the titanium ionized physical vapor deposition process Kersch A, Hansen U Journal of Vacuum Science & Technology A, 20(4), 1284, 2002 |
| 4 |
Thermal modelling of RTP and RTCVD processes Kersch A, Schafbaur T Thin Solid Films, 365(2), 307, 2000 |
| 5 |
A Gas-Phase and Surface Kinetics Model for Silicon Epitaxial-Growth with Sih2Cl2 in an Rtcvd Reactor Hierlemann M, Kersch A, Werner C, Schafer H Journal of the Electrochemical Society, 142(1), 259, 1995 |