| 1 |
Towards Fully Aqueous Ozone Wet Strip of 193 nm Photoresist Stack Using UV Pre-Treatments in Low-k Patterning Applications
Kesters E, Le QT, Lux M, Pittevils J, Vereecke G, Struyf H, De Gendt S
Journal of the Electrochemical Society, 159(5), D287, 2012 |
| 2 |
Characterization of Modification of 193-nm Photoresist by HBr Plasma
Vereecke G, Claes M, Le QT, Kesters E, Struyf H, Carleer R, Adriaensens P
Electrochemical and Solid State Letters, 14(10), H408, 2011 |
| 3 |
Characterization of post-etched photoresist and residues by various analytical techniques
Franquet A, Claes M, Conard T, Kesters E, Vereecke G, Vandervorst W
Applied Surface Science, 255(4), 1408, 2008 |
| 4 |
Chemical and structural modifications in a 193-nm photoresist after low-k dry etch
Kesters E, Claes M, Le QT, Lux M, Franquet A, Vereecke G, Mertens PW, Frank MM, Carleer R, Adriaensens P, Biebuyk JJ, Bebelman S
Thin Solid Films, 516(11), 3454, 2008 |
| 5 |
Isothermal elimination of n-alkylsulfinyl OC1C10-PPV precursor polymers studied with FT-IR, UV-vis, and MTDSC: Kinetics of the elimination reaction
Kesters E, Swier S, Van Assche G, Lutsen L, Vanderzande D, Van Mele B
Macromolecules, 39(9), 3194, 2006 |
| 6 |
Non-isothermal elimination process in the solid state of n-alkyl-sulphinyl precursor polymers towards conjugated poly[2-(3',7'-dimethyloctyloxy)-5-methoxy-1,4-phenylene vinylene] studied with MTDSC and TGA
Kesters E, Swier S, Van Assche G, Lutsen L, Vanderzande D, Van Mele B
Polymer, 47(23), 7935, 2006 |
| 7 |
Removal of plasma-modified low-k layer using dilute HF: Influence of concentration
Le QT, Baklanov MR, Kesters E, Azioune A, Struyf H, Boullart W, Pireaux JJ, Vanhaelemeersch S
Electrochemical and Solid State Letters, 8(7), F21, 2005 |
| 8 |
Study of the thermal elimination and degradation processes of n-alkylsulfinyl-PPV and -OC1C10-PPV precursor polymers with in situ spectroscopic techniques
Kesters E, Vanderzande D, Lutsen L, Penxten H, Carleer R
Macromolecules, 38(4), 1141, 2005 |
| 9 |
Polymerization behavior of xanthate-containing monomers toward PPV precursor polymers: Study of the elimination behavior of precursor polymers and oligomers with in-situ FT-IR and UV-Vis analytical techniques
Kesters E, Gillissen S, Motmans F, Lutsen L, Vanderzande D
Macromolecules, 35(21), 7902, 2002 |
| 10 |
The thermal conversion reaction of sulphonyl substituted poly (para-xylylene): evidence for the formation of PPV structures
Kesters E, de Kok MM, Carleer RAA, Czech JHPB, Adriaensens PJ, Gelan JM, Vanderzande DJ
Polymer, 43(21), 5749, 2002 |
