검색결과 : 2건
No. | Article |
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1 |
Oxygen addition to fluorine based SiN etch process: Impact on the electrical properties of AlGaN/GaN 2DEG and transistor characteristics Hahn H, Achenbach J, Ketteniss N, Noculak A, Kalisch H, Vescan A Solid-State Electronics, 67(1), 90, 2012 |
2 |
The role of strain in controlling the surface morphology of AlxGa1-xN following in situ treatment with SiH4 and NH3 Ketteniss N, Oliver RA, McAleese C, Kappers MJ, Zhang Y, Humphreys CJ Applied Surface Science, 254(7), 2124, 2008 |