검색결과 : 2건
No. | Article |
---|---|
1 |
Stabilizing inductively coupled plasma source impedance and plasma uniformity using a Faraday shield Khater MH, Overzet LJ Journal of Vacuum Science & Technology A, 19(3), 785, 2001 |
2 |
Effects of gas distribution on polysilicon etch rate uniformity for a low pressure, high density plasma Khater MH, Overzet LJ, Cherrington BE Journal of Vacuum Science & Technology B, 16(2), 490, 1998 |