화학공학소재연구정보센터
검색결과 : 13건
No. Article
1 Light-wave dynamic control of magnetism
Siegrist F, Gessner JA, Ossiander M, Denker C, Chang YP, Schroder MC, Guggenmos A, Cui Y, Walowski J, Martens U, Dewhurst JK, Kleineberg U, Munzenberg M, Sharma S, Schultze M
Nature, 571(7764), 240, 2019
2 Direct observation of electron propagation and dielectric screening on the atomic length scale
Neppl S, Ernstorfer R, Cavalieri AL, Lemell C, Wachter G, Magerl E, Bothschafter EM, Jobst M, Hofstetter M, Kleineberg U, Barth JV, Menzel D, Burgdorfer J, Feulner P, Krausz F, Kienberger R
Nature, 517(7534), 342, 2015
3 Delay in Photoemission
Schultze M, Fiess M, Karpowicz N, Gagnon J, Korbman M, Hofstetter M, Neppl S, Cavalieri AL, Komninos Y, Mercouris T, Nicolaides CA, Pazourek R, Nagele S, Feist J, Burgdorfer J, Azzeer AM, Ernstorfer R, Kienberger R, Kleineberg U, Goulielmakis E, Krausz F, Yakovlev VS
Science, 328(5986), 1658, 2010
4 Preparation and characterization of gold nanocrystals on NaCl(100) surfaces as labels for the dynamical x-ray tracking technique
Slieh J, Winter A, Gryzia A, Brechling A, Hachmann W, Jacob S, Kandlbinder A, Dietz KJ, Kleineberg U, Heinzmann U
Thin Solid Films, 517(11), 3257, 2009
5 Actinic extreme ultraviolet lithography mask blank defect inspection by photoemission electron microscopy
Lin JQ, Neuhaeusler U, Slieh J, Brechling A, Kleineberg U, Heinzmann U, Oelsner A, Valdaitsev D, Schoenhense G, Weber N, Escher M, Merkel M
Journal of Vacuum Science & Technology B, 24(6), 2631, 2006
6 Characterization and tests of planar Co3O4 model catalysts prepared by chemical vapor deposition
Bahlawane N, Rivera EF, Kohse-Hoinghaus K, Brechling A, Kleineberg U
Applied Catalysis B: Environmental, 53(4), 245, 2004
7 Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask
Dreeskornfeld L, Haindl G, Kleineberg U, Heinzmann U, Shi F, Volland B, Rangelow IW, Majkova E, Luby S, Kostic, Matay L, Hrkut P, Hudek P, Lee HY
Thin Solid Films, 458(1-2), 227, 2004
8 Aperiodic nanometer multilayer systems as optical key components for attosecond electron spectroscopy
Wonisch A, Westerwalbesloh T, Hachmann W, Kabachnik N, Kleineberg U, Heinzmann U
Thin Solid Films, 464-65, 473, 2004
9 Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing
Kleineberg U, Westerwalbesloh T, Hachmann W, Heinzmann U, Tummler J, Scholze F, Ulm G, Mullender S
Thin Solid Films, 433(1-2), 230, 2003
10 Characterization of DMPC bilayers and multilamellar islands on hydrophobic self-assembled monolayers of ODS/Si(100) and mixed ODS-DDS/Si(100)
Brechling A, Sundermann M, Kleineberg U, Heinzmann U
Thin Solid Films, 433(1-2), 281, 2003