검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films Jinesh KB, van Hemmen JL, van de Sanden MCM, Roozeboom F, Klootwijk JH, Besling WFA, Kessels WMM Journal of the Electrochemical Society, 158(2), G21, 2011 |
| 2 |
On the electrochemistry of an anode stack for all-solid-state 3D-integrated batteries Baggetto L, Oudenhoven JFM, van Dongen T, Klootwijk JH, Mulder M, Niessen RAH, de Croon MHJM, Notten PHL Journal of Power Sources, 189(1), 402, 2009 |
| 3 |
Deposition of TiN and TaN by Remote Plasma ALD for Cu and Li Diffusion Barrier Applications Knoops HCM, Baggetto L, Langereis E, van de Sanden MCM, Klootwijk JH, Roozeboom F, Niessen RAH, Notten PHL, Kessels WMM Journal of the Electrochemical Society, 155(12), G287, 2008 |
| 4 |
Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor van Hemmen JL, Heil SBS, Klootwijk JH, Roozeboom F, Hodson CJ, van de Sanden MCM, Kessels WMM Journal of the Electrochemical Society, 154(7), G165, 2007 |
| 5 |
Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor Heil SBS, van Hemmen JL, Hodson CJ, Singh N, Klootwijk JH, Roozeboom F, de Sanden MCMV, Kessels WMM Journal of Vacuum Science & Technology A, 25(5), 1357, 2007 |