1 |
Nondestructive, in-line characterization of device performance parameters of shallow junction processes Kluth GJ, En WG, Borden P, Bechtler L, Nijmeijer R Journal of Vacuum Science & Technology B, 20(2), 640, 2002 |
2 |
Formation of alkylsiloxane self-assembled monolayers on Si3N4 Sung MM, Kluth GJ, Maboudian R Journal of Vacuum Science & Technology A, 17(2), 540, 1999 |
3 |
Study of the desorption mechanism of alkylsiloxane self-assembled monolayers through isotopic labeling and high resolution electron energy-loss spectroscopy experiments Kluth GJ, Sander M, Sung MM, Maboudian R Journal of Vacuum Science & Technology A, 16(3), 932, 1998 |
4 |
Thermal-Behavior of Alkylsiloxane Self-Assembled Monolayers on the Oxidized Si(100) Surface Kluth GJ, Sung MM, Maboudian R Langmuir, 13(14), 3775, 1997 |
5 |
Thermal-Behavior of Alkyl Monolayers on Silicon Surfaces Sung MM, Kluth GJ, Yauw OW, Maboudian R Langmuir, 13(23), 6164, 1997 |
6 |
Interaction of H(D) Atoms with Octadecylsiloxane Self-Assembled Monolayers on the Si(100) Surface Kluth GJ, Sung MM, Maboudian R Langmuir, 13(24), 6491, 1997 |