| 1 |
Reliability and characteristics of magnetron sputter deposited tantalum nitride for thin film resistors
Lee DW, Kim YN, Cho MY, Ko PJ, Lee D, Koo SM, Moon KS, Oh JM
Thin Solid Films, 660, 688, 2018 |
| 2 |
Inverse-feedforward and robust-feedback control for high-speed operation on piezo-stages
Ko PJ, Wang YP, Tien SC
International Journal of Control, 86(2), 197, 2013 |
| 3 |
Influence of a post-chemical mechanical polishing cleaning process on the ferroelectric properties of a Pb(Zr,Ti)O-3 thin film capacitor fabricated by the damascene process
Kim NH, Jun YK, Ko PJ, Lee WS
Journal of Vacuum Science & Technology A, 26(4), 720, 2008 |
| 4 |
Improvement of the surface roughness and sensing properties of cerium dioxide thin film by chemical mechanical polishing
Kim NH, Ko PJ, Lee WS
Journal of Vacuum Science & Technology A, 26(4), 794, 2008 |
| 5 |
Chemical mechanical polishing characteristics in (Bi,La)Ti3O12 damascene process for high-density ferroelectric memories
Kim NH, Shin SH, Ko PJ, Lee WS
Thin Solid Films, 515(16), 6456, 2007 |
| 6 |
Chemical mechanical polishing (CMP) mechanisms of thermal SiO2 film after high-temperature pad conditioning
Kim NH, Ko PJ, Choi GW, Seo YJ, Lee WS
Thin Solid Films, 504(1-2), 166, 2006 |
| 7 |
Chemical mechanical polishing of BTO thin film for vertical sidewall patterning of high-density memory capacitor
Kim NH, Ko PJ, Seo YJ, Lee WS
Thin Solid Films, 504(1-2), 261, 2006 |
| 8 |
Chemical mechanical planarization characteristics of WO3 thin film for gas sensing
Seo YJ, Kim NH, Chang EG, Park J, Ko PJ, Lee WS
Journal of Vacuum Science & Technology A, 23(4), 737, 2005 |
