검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Are extreme ultraviolet resists ready for the 32 nm node? Petrillo K, Wei Y, Brainard R, Denbeaux G, Goldfarb D, Koay CS, Mackey J, Montgomery W, Pierson W, Wallow T, Wood O Journal of Vacuum Science & Technology B, 25(6), 2490, 2007 |
| 2 |
Ion emission measurements and mirror erosion studies for extreme ultraviolet lithography Takenoshita K, Koay CS, George S, Teerawattansook S, Richardson M, Bakshi V Journal of Vacuum Science & Technology B, 23(6), 2879, 2005 |
| 3 |
High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography Richardson M, Koay CS, Takenoshita K, Keyser C, Al-Rabban M Journal of Vacuum Science & Technology B, 22(2), 785, 2004 |