1 |
Charge transient spectroscopy measurements of GaAs metal-insulator-semiconductor structures Kochowski S, Szydlowski M, Thurzo I, Zahn DRT Applied Surface Science, 252(21), 7631, 2006 |
2 |
Studies of GaAs metal-insulator-semiconductor structures by the admittance spectroscopy method Kochowski S, Nitsch K, Paszkiewicz B, Paszkiewicz R, Szydlowski M Applied Surface Science, 235(3), 389, 2004 |
3 |
Characterization of the interface and the bulk phenomena in metal-SiO2-(n) GaAs structure by analysis of the equivalent circuit parameters at different temperatures Kochowski S, Nitsch K, Paszkiewicz B, Paszkiewicz R Thin Solid Films, 467(1-2), 190, 2004 |
4 |
Two constant phase element behaviour of the admittance characteristics of GaAs metal-insulator-semiconductor structure with deep traps Kochowski S, Nitsch K, Paszkiewicz B, Paszkiewicz R Thin Solid Films, 444(1-2), 208, 2003 |
5 |
Description of the frequency behaviour of metal-SiO2-GaAs structure characteristics by electrical equivalent circuit with constant phase element Kochowski S, Nitsch K Thin Solid Films, 415(1-2), 133, 2002 |
6 |
Electrical properties of SiO2-(n) GaAs interface on the basis of measurements of MIS structure capacitance and conductance Kochowski S, Nitsch K, Paszkiewicz R Thin Solid Films, 348(1-2), 180, 1999 |