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| No. | Article |
|---|---|
| 1 |
Tungsten Nitrido Complexes as Precursors for Low Temperature Chemical Vapor Deposition of WNxCy Films as Diffusion Barriers for Cu Metallization McClain KR, O'Donohue C, Koley A, Bonsu RO, Abboud KA, Revelli JC, Anderson TJ, McElwee-White L Journal of the American Chemical Society, 136(4), 1650, 2014 |