검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Selective etching of Si(1-x)Ge(x) versus Si with gaseous HCl for the formation of advanced CMOS devices Loubet N, Kormann T, Chabanne G, Denorme S, Dutartre D Thin Solid Films, 517(1), 93, 2008 |
| 2 |
Ex-situ wet clean and in-situ hydrogen clean for Si and SiGe epitaxy Kormann T, Garnier P, Chabanne G, Fortuin A Thin Solid Films, 517(1), 269, 2008 |