| 1 |
Synthesis and characterization of organosilicon compounds as novel precursors for CVD processes
Ermakova EN, Sysoev SV, Nikulina LD, Tsyrendorzhieva IP, Rakhlin VI, Kosinova ML
Thermochimica Acta, 622, 2, 2015 |
| 2 |
Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor
Sulyaeva VS, Kosinova ML, Rumyantsev YM, Kuznetsov FA, Kesler VG, Kirienko VV
Thin Solid Films, 558, 112, 2014 |
| 3 |
Silicon carbonitride nanolayers - Synthesis and chemical characterization
Hoffmann PS, Fainer NI, Baake O, Kosinova ML, Rumyantsev YM, Trunova VA, Klein A, Pollakowski B, Beckhoff B, Ensinger W
Thin Solid Films, 520(18), 5906, 2012 |
| 4 |
Synthesis of nanocrystalline silicon carbonitride films by remote plasma enhanced chemical vapor deposition using the mixture of hexamethyldisilazane with helium and ammonia
Fainer NI, Rumyantsev YM, Golubenko AN, Kosinova ML, Kuznetsov FA
Journal of Crystal Growth, 248, 175, 2003 |
| 5 |
A study of the thermal annealing influence on the structure and phase composition of silicon carbonitride films by the diffraction of synchrotron radiation
Fainer NI, Maximovski EA, Kosinova ML, Rumyantsev YM
Materials Science Forum, 378-3, 493, 2001 |
| 6 |
Model and computer simulation results of defect transformation and decomposition of SiNx : H films during high temperature treatment
Gadiyak GV, Gadiyak VG, Kosinova ML, Salman EG
Thin Solid Films, 335(1-2), 19, 1998 |
| 7 |
On Thermodynamic Equilibria of Solid BN and Gas Phases in the B-N-H-Cl-He System
Golubenko AN, Kosinova ML, Titov VA, Titov AA, Kuznetsov FA
Thin Solid Films, 293(1-2), 11, 1997 |
| 8 |
Growth of PbS and CdS Thin-Films by Low-Pressure Chemical-Vapor-Deposition Using Dithiocarbamates
Fainer NI, Kosinova ML, Rumyantsev YM, Salman EG, Kuznetsov FA
Thin Solid Films, 280(1-2), 16, 1996 |
| 9 |
Plasma-Deposited CdS Layers from (O-Phen)bis(Diethyldithiocarbamate) Cadmium
Fainer NI, Rumyantsev YM, Salman EG, Kosinova ML, Yurjev GS, Sysoeva NP, Maximovskii EA, Sysoev SV, Golubenko AN
Thin Solid Films, 286(1-2), 122, 1996 |
| 10 |
Chemical-Stability of Hydrogen-Containing Boron-Nitride Films Obtained by Plasma-Enhanced Chemical-Vapor-Deposition
Akkerman ZL, Kosinova ML, Fainer NI, Rumjantsev YM, Sysoeva NP
Thin Solid Films, 260(2), 156, 1995 |
