검색결과 : 3건
No. | Article |
---|---|
1 |
Properties of sputtered TaReGe used as an x-ray mask absorber material Yoshihara T, Kotsuji S, Fujii K, Tsuboi S, Suzuki K Journal of Vacuum Science & Technology B, 16(6), 3491, 1998 |
2 |
Low-stress sputtered chromium-nitride hardmasks for x-ray mask fabrication Tsuboi S, Kotsuji S, Yoshihara T, Suzuki K Journal of Vacuum Science & Technology B, 15(6), 2228, 1997 |
3 |
Sputtered Tax Film Properties for X-Ray Mask Absorbers Yoshihara T, Kotsuji S, Suzuki K Journal of Vacuum Science & Technology B, 14(6), 4363, 1996 |