화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Properties of sputtered TaReGe used as an x-ray mask absorber material
Yoshihara T, Kotsuji S, Fujii K, Tsuboi S, Suzuki K
Journal of Vacuum Science & Technology B, 16(6), 3491, 1998
2 Low-stress sputtered chromium-nitride hardmasks for x-ray mask fabrication
Tsuboi S, Kotsuji S, Yoshihara T, Suzuki K
Journal of Vacuum Science & Technology B, 15(6), 2228, 1997
3 Sputtered Tax Film Properties for X-Ray Mask Absorbers
Yoshihara T, Kotsuji S, Suzuki K
Journal of Vacuum Science & Technology B, 14(6), 4363, 1996