화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Interface properties of MBE-grown MOS structures with InGaAs/InAlAs buried channel and in-situ high-k oxide
Oktyabrsky S, Tokranov V, Koveshnikov S, Yakimov M, Kambhampati R, Bakhru H, Moore R, Tsai W
Journal of Crystal Growth, 311(7), 1950, 2009
2 Metal gate HfO2 metal-oxide-semiconductor structures on InGaAs substrate with varying Si interface passivation layer and postdeposition anneal condition
Ok I, Kim H, Zhang M, Zhu F, Park S, Yum J, Koveshnikov S, Tsai W, Tokranov V, Yakimov M, Oktyabrsky S, Lee JC
Journal of Vacuum Science & Technology B, 25(4), 1491, 2007
3 Test methods for measuring bulk copper and nickel in heavily doped p-type silicon wafers
Fabry L, Hoelzl R, Andrukhiv A, Matsumoto K, Qiu J, Koveshnikov S, Goldstein M, Grabau A, Horie H, Takeda R
Journal of the Electrochemical Society, 153(6), G566, 2006
4 Lateral gettering of Fe on bulk and silicon-on-insulator wafers
Beaman KL, Kononchuk O, Koveshnikov S, Osburn CM, Rozgonyi GA
Journal of the Electrochemical Society, 146(5), 1925, 1999