검색결과 : 9건
No. | Article |
---|---|
1 |
Measuring in Situ Length Distributions of Polymer-Wrapped Monochiral Single-Walled Carbon Nanotubes Dispersed in Toluene with Analytical Ultracentrifugation Selvasundaram PB, Kraft R, Li WS, Fischer R, Kappes MM, Hennrich F, Krupke R Langmuir, 35(10), 3790, 2019 |
2 |
The Na+/Ca2+ exchange inhibitor KB-R7943 potently blocks TRPC channels Kraft R Biochemical and Biophysical Research Communications, 361(1), 230, 2007 |
3 |
Sulfur oxidation in Paracoccus pantotrophus: interaction of the sulfur-binding protein SoxYZ with the dimanganese SoxB protein Quentmeier A, Hellwig P, Bardischewsky F, Grelle G, Kraft R, Friedrich CG Biochemical and Biophysical Research Communications, 312(4), 1011, 2003 |
4 |
Modeling and optimization of oxynitride gate dielectrics formation by remote plasma nitridation of silicon dioxide Kapila D, Hattangady S, Douglas M, Kraft R, Gribelyuk M Journal of the Electrochemical Society, 146(3), 1111, 1999 |
5 |
ICOS is an inducible T-cell co-stimulator structurally and functionally related to CD28 Hutloff A, Dittrich AM, Beier KC, Eljaschewitsch B, Kraft R, Anagnostopoulos I, Kroczek RA Nature, 397(6716), 263, 1999 |
6 |
Oxide loss at the gate periphery during high density plasma etching Kraft R, Gupta I, Kinoshita T Journal of Vacuum Science & Technology B, 16(2), 496, 1998 |
7 |
Surface Nitridation of Silicon Dioxide with a High-Density Nitrogen Plasma Kraft R, Schneider TP, Dostalik WW, Hattangady S Journal of Vacuum Science & Technology B, 15(4), 967, 1997 |
8 |
Etching 0.35 Mu-M Polysilicon Gates on a High-Density Helicon Etcher Kraft R, Boonstra T, Prengle S Journal of Vacuum Science & Technology B, 14(1), 543, 1996 |
9 |
Gate Oxide Loss at the Periphery of a Metal-Oxide-Semiconductor Field-Effect Transistor Resulting from a Polysilicon Gate Etch with a Helicon Etch Tool Kraft R, Krishnan S Journal of Vacuum Science & Technology B, 13(6), 2226, 1995 |