1 |
Optical and chemical characterization of expanding thermal plasma deposited silicon dioxide-like films Creatore M, Cigal JC, Kroesen GMW, van de Sanden MCM Thin Solid Films, 484(1-2), 104, 2005 |
2 |
Micro-disperse particles as probes for plasma surface interaction Kersten H, Deutsch H, Otte M, Swinkels GHPM, Kroesen GMW Thin Solid Films, 377-378, 530, 2000 |
3 |
Proceedings of the 2nd International Workshop on basic aspects of non-equilibrium plasmas interacting with surfaces (BANPIS-2000) - Huis Ten Bosch, Nagasaki, Japan, January 28-30, 2000 -Preface Tachibana K, Economou DJ, Graves DB, Kroesen GMW, Ono K, Sugai H Thin Solid Films, 374(2), VII, 2000 |
4 |
Investigations of the surface chemistry of silicon substrates etched in a rf-biased inductively coupled fluorocarbon plasma using Fourier-transform infrared ellipsometry Kroesen GMW, Lee HJ, Moriguchi H, Motomura H, Shirafuji T, Tachibana K Journal of Vacuum Science & Technology A, 16(1), 225, 1998 |
5 |
On the energy influx to the substrate during sputter deposition of thin aluminium films Kersten H, Kroesen GMW, Hippler R Thin Solid Films, 332(1-2), 282, 1998 |