화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Chiral chemistry and technology of agrochemicals
Polec I, Komorowska-Kulik J, Legocki J
Przemysl Chemiczny, 86(6), 530, 2007
2 Impact of deposition and annealing temperature on material and electrical characteristics of ALD HfO2
Triyoso D, Liu R, Roan D, Ramon M, Edwards NV, Gregory R, Werho D, Kulik J, Tam G, Irwin E, Wang XD, La LB, Hobbs C, Garcia R, Baker J, White BE, Tobin P
Journal of the Electrochemical Society, 151(10), F220, 2004
3 Advances in heteroepitaxy of oxides on silicon
Yu Z, Liang Y, Overgaard C, Hu X, Curless J, Li H, Wei Y, Craigo B, Jordan D, Droopad R, Finder J, Eisenbeiser K, Marshall D, Moore K, Kulik J, Fejes P
Thin Solid Films, 462-63, 51, 2004
4 HfO2 gate dielectrics deposited via tetrakis diethylamido hafnium
Schaeffer J, Edwards NV, Liu R, Roan D, Hradsky B, Gregory R, Kulik J, Duda E, Contreras L, Christiansen J, Zollner S, Tobin P, Nguyen BY, Nieh R, Ramon M, Rao R, Hegde R, Rai R, Baker J, Voight S
Journal of the Electrochemical Society, 150(4), F67, 2003
5 Ultraviolet-Raman studies of SrTiO3 ultrathin films on Si
Tisinger LH, Liu R, Kulik J, Zhang X, Ramdani J, Demkov AA
Journal of Vacuum Science & Technology B, 21(1), 53, 2003
6 Surface composition of BN, CN, and BCN thin films
Tempez A, Badi N, Bensaoula A, Kulik J
Journal of Vacuum Science & Technology A, 16(5), 2896, 1998
7 Formation of C-N Thin-Films by Ion-Beam Deposition
Boyd KJ, Marton D, Todorov SS, Albayati AH, Kulik J, Zuhr RA, Rabalais JW
Journal of Vacuum Science & Technology A, 13(4), 2110, 1995
8 Homoepitaxy and Controlled Oxidation of Silicon at Low-Temperatures Using Low-Energy Ion-Beams
Albayati AH, Todorov SS, Boyd KJ, Marton D, Rabalais JW, Kulik J
Journal of Vacuum Science & Technology B, 13(4), 1639, 1995