검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Formation of strained-silicon layer on thin relaxed-SiGe/SiO2/Si structure using SIMOX technology Sugiyama N, Mizuno T, Takagi S, Koike M, Kurobe A Thin Solid Films, 369(1-2), 199, 2000 |
| 2 |
Transport properties of two-dimensional electron gas in a strained-Si/SiGe heterostructure at low carrier densities Hatakeyama T, Tezuka T, Sugiyama N, Kurobe A Thin Solid Films, 369(1-2), 328, 2000 |
| 3 |
Experimental evidence of valence band deformation due to strain in inverted hole channel of strained-Si pMOSFETs Tezuka T, Kurobe A, Sugiyama N, Takagi S Thin Solid Films, 369(1-2), 338, 2000 |