| 1 |
Advanced transfer system for spin coating film transfer and hot-pressing in planarization technology
Sato N, Machida K, Kudou K, Yano M, Kyuragi H
Journal of Vacuum Science & Technology B, 20(3), 797, 2002 |
| 2 |
Effect of thinning a WSiN/WSIx barrier layer on its barrier capability
Hirata A, Maeda T, Machida K, Maeda M, Yasui K, Kyuragi H
Journal of Vacuum Science & Technology B, 19(3), 788, 2001 |
| 3 |
Novel global planarization technology for interlayer dielectrics using spin on glass film transfer and hot pressing
Machida K, Kyuragi H, Akiya H, Imai K, Tounai A, Nakashima A
Journal of Vacuum Science & Technology B, 16(3), 1093, 1998 |
| 4 |
Electrical Characteristics of a WSix Contact Electrode with a Wsixn Diffusion Barrier Formed by Using Electron-Cyclotron-Resonance Plasma Nitridation
Hirata A, Hosoya T, Machida K, Kyuragi H, Akiya H
Journal of the Electrochemical Society, 144(11), 3993, 1997 |
| 5 |
Role of Low-Energy Secondary Electrons in Synchrotron Radiation-Excited Chemical-Vapor-Deposition of Silicon-Nitride Films
Kyuragi H
Journal of Vacuum Science & Technology A, 15(5), 2644, 1997 |
| 6 |
Characterization of Silicon-Nitride Films Formed by Synchrotron Radiation-Excited Chemical-Vapor-Deposition
Kyuragi H
Journal of Vacuum Science & Technology B, 14(5), 3305, 1996 |
