검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Mechanisms of Reduction of the Internal-Stress in Hydrogenated Silicon-Oxide Films Prepared by Ar-H-2 Sputtering Takahashi H, Nishiguchi A, Nagata H, Kataoka H, Fujishima M Thin Solid Films, 281-282, 348, 1996 |
| No. | Article |
|---|---|
| 1 |
Mechanisms of Reduction of the Internal-Stress in Hydrogenated Silicon-Oxide Films Prepared by Ar-H-2 Sputtering Takahashi H, Nishiguchi A, Nagata H, Kataoka H, Fujishima M Thin Solid Films, 281-282, 348, 1996 |