검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Plasma Composition by Mass Spectrometry in a Ar-SiH4-H-2 LEPECVD Process During nc-Si Deposition Moiseev T, Chrastina D, Isella G Plasma Chemistry and Plasma Processing, 31(1), 157, 2011 |
| 2 |
Structural characterization of nc-Si films grown by low-energy PECVD on different substrates Le Donne A, Binetti S, Isella G, Pichaud B, Texier M, Acciarri M, Pizzini S Applied Surface Science, 254(9), 2804, 2008 |