검색결과 : 13건
| No. | Article |
|---|---|
| 1 |
Raster shaped beam pattern generation Rishton SA, Varner JK, Veneklasen LH, Boegli V, Sagle AL, Hofmann U, Kao H, Wang W Journal of Vacuum Science & Technology B, 17(6), 2927, 1999 |
| 2 |
Chrome on glass mask writing at 75 kV with the IBM EL4+electron-beam system Hartley JG, Groves TR Journal of Vacuum Science & Technology B, 17(6), 2932, 1999 |
| 3 |
Mask bias requirement for 0.13 mu m e-beam block exposure lithography Takahashi K, Kanata H, Nara Y Journal of Vacuum Science & Technology B, 16(6), 3279, 1998 |
| 4 |
Commercialization of SCALPEL masks Farrow RC, Novembre AE, Peabody M, Kasica R, Blakey M, Liddle JA, Werder K, DeMarco R, Ocola L, Rutberg L, Saunders T, Unruh J, Qian F, Smith M Journal of Vacuum Science & Technology B, 16(6), 3582, 1998 |
| 5 |
Design Optimization for 2 Lens Focused Ion-Beam Columns Wang L Journal of Vacuum Science & Technology B, 15(4), 833, 1997 |
| 6 |
Effects of accelerating voltage and pattern size on electron scattering by electron-beam mask Yamashita H, Nomura E, Nozue H Journal of Vacuum Science & Technology B, 15(6), 2263, 1997 |
| 7 |
Triangular-Variable-Shaped Beams Using the Cell Projection Method Someda Y, Shoda Y, Saitou N Journal of Vacuum Science & Technology B, 14(6), 3742, 1996 |
| 8 |
Multielectron Beam Blanking Aperture Array System Synapse-2000 Yasuda H, Arai S, Kai J, Ooae Y, Abe T, Maruyama S, Kiuchi T Journal of Vacuum Science & Technology B, 14(6), 3813, 1996 |
| 9 |
Patterning Accuracy Estimation During Stage Acceleration in the Electron-Beam Direct Writing System Ex-8D Hattori K, Magoshi S, Ando A, Satoh S, Sunaoshi H, Suenaga M, Housai H, Hashimoto S, Wada H, Sugihara K Journal of Vacuum Science & Technology B, 14(6), 3985, 1996 |
| 10 |
Fabrication Issues for the Prototype National-Institute-of-Standards-and-Technology Srm-2090A Scanning Electron-Microscope Magnification Calibration Standard Newell BL, Postek MT, Vanderziel J Journal of Vacuum Science & Technology B, 13(6), 2671, 1995 |