검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Parametric study of the etching of SiO2 in SF6 plasmas: Modeling of the etching kinetics and validation Lagarde T, Pelletier J, Arnal Y Journal of Vacuum Science & Technology B, 17(1), 118, 1999 |
| 2 |
Highly Homogeneous Silica Coatings for Optical and Protective Applications Deposited by PECVD at Room-Temperature in a Planar Uniform Distributed Electron-Cyclotron-Resonance Plasma Reactor Rostaing JC, Coeuret F, Pelletier J, Lagarde T, Etemadi R Thin Solid Films, 270(1-2), 49, 1995 |
| 3 |
Chemical-Vapor-Deposition in High-Density Low-Pressure Plasmas - Reactor Scale-Up and Performance Pelletier J, Lagarde T Thin Solid Films, 241(1-2), 240, 1994 |