화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 Nanoscale etching of III-V semiconductors in acidic hydrogen peroxide solution: GaAs and InP, a striking contrast in surface chemistry
van Dorp DH, Arnauts S, Laitinen M, Sajavaara T, Meersschaut J, Conard T, Kelly JJ
Applied Surface Science, 465, 596, 2019
2 Characterization and Electrochemical Properties of Oxygenated Amorphous Carbon (a-C) Films
Palomakia T, Wester N, Johansson LS, Laitinen M, Jiang H, Arstila K, Sajavaara T, Han JG, Koskinen J, Laurila T
Electrochimica Acta, 220, 137, 2016
3 Effect of ozone concentration on silicon surface passivation by atomic layer deposited Al2O3
von Gastrow G, Li S, Putkonen M, Laitinen M, Sajavaara T, Savin H
Applied Surface Science, 357, 2402, 2015
4 Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
Ylivaara OME, Liu XW, Kilpi L, Lyytinen J, Schneider D, Laitinen M, Julin J, Ali S, Sintonen S, Berdova M, Haimi E, Sajavaara T, Ronkainen H, Lipsanen H, Koskinen J, Hannula SP, Puurunen RL
Thin Solid Films, 552, 124, 2014
5 Influence of titanium-substrate roughness on Ca-P-O thin films grown by atomic layer deposition
Sagari ARA, Malm J, Laitinen M, Rahkila P, Ma HQ, Putkonen M, Karppinen M, Whitlow HJ, Sajavaara T
Thin Solid Films, 531, 26, 2013
6 Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen
Kukli K, Aarik J, Aidla A, Jogi I, Arroval T, Lu J, Sajavaara T, Laitinen M, Kiisler AA, Ritala M, Leskela M, Peck J, Natwora J, Geary J, Spohn R, Meiere S, Thompson DM
Thin Solid Films, 520(7), 2756, 2012
7 Properties of AlN grown by plasma enhanced atomic layer deposition
Bosund M, Sajavaara T, Laitinen M, Huhtio T, Putkonen M, Airaksinen VM, Lipsanen H
Applied Surface Science, 257(17), 7827, 2011
8 Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen
Kukli K, Kemell M, Puukilainen E, Aarik J, Aidla A, Sajavaara T, Laitinen M, Tallarida M, Sundqvist J, Ritala M, Leskela M
Journal of the Electrochemical Society, 158(3), D158, 2011
9 Programmable proximity aperture lithography with MeV ion beams
Puttaraksa N, Gorelick S, Sajavaara T, Laitinen M, Singkarat S, Whitlow HJ
Journal of Vacuum Science & Technology B, 26(5), 1732, 2008