화학공학소재연구정보센터
검색결과 : 15건
No. Article
1 Synthesis and characterization of microcrystalline diamond to ultrananocrystalline diamond films via Hot Filament Chemical Vapor Deposition for scaling to large area applications
Fuentes-Fernandez EMA, Alcantar-Pena JJ, Lee G, Boulom A, Phan H, Smith B, Nguyen T, Sahoo S, Ruiz-Zepeda F, Arellano-Jimenez MJ, Gurman P, Martinez-Perez CA, Yacaman MJ, Katiyar RS, Auciello O
Thin Solid Films, 603, 62, 2016
2 Deposition of Bi3.15Nd0.85Ti3O12 ferroelectric thin films on 5-inch diameter Si wafers by a modified pulsed laser deposition method
Li S, Zhong XL, Jia YR, Wang JB, Li B, Tan CB, Zhou YC
Thin Solid Films, 591, 126, 2015
3 Trajectory effect on the properties of large area ZnO thin films deposited by atmospheric pressure plasma jet
Juang JY, Chou TS, Lin HT, Chou YF, Weng CC
Applied Surface Science, 314, 1074, 2014
4 Deposition of zinc oxide thin films by an atmospheric pressure plasma jet
Hsu YW, Li HC, Yang YJ, Hsu CC
Thin Solid Films, 519(10), 3095, 2011
5 Characterisation of thin film silicon films deposited by plasma enhanced chemical vapour deposition at 162 MHz, using a large area, scalable, multi-tile-electrode plasma source
Monaghan E, Michna T, Gaman C, O'Farrel D, Ryan K, Adley D, Perova TS, Drews B, Jaskot M, Ellingboe AR
Thin Solid Films, 519(20), 6884, 2011
6 Control of large area VHF plasma produced at high pressure
Nishimiya T, Yamane T, Takeuchi Y, Yamauchi Y, Takatsuka H, Muta H, Uchino K, Kawai Y
Thin Solid Films, 519(20), 6931, 2011
7 Uniformity of gallium doped zinc oxide thin film prepared by pulsed laser deposition
Mitsugi F, Umeda Y, Sakai N, Ikegami T
Thin Solid Films, 518(22), 6334, 2010
8 Control of plasma process instabilities during thin silicon film deposition
Hrunski D, Grahlert W, Beese H, Kilper T, Gordijn A, Appenzeller W
Thin Solid Films, 517(14), 4188, 2009
9 Thickness determination of large-area films of yttria-stabilized zirconia produced by pulsed laser deposition
Pryds N, Toftmann B, Bilde-Sorensen JB, Schou J, Linderoth S
Applied Surface Science, 252(13), 4882, 2006
10 Development of catalytic chemical vapor deposition apparatus for large size substrates
Osono S, Kitazoe M, Tsuboi H, Asari S, Saito K
Thin Solid Films, 501(1-2), 61, 2006