화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Hyper high numerical aperature achromatic interferometer for immersion lithography at 193 nm
Charley AL, Lagrange A, Lartigue O, Simon J, Thony P, Schiavone P
Journal of Vacuum Science & Technology B, 23(6), 2668, 2005
2 Spectroscopic ellipsometry with compensator and X-ray specular reflectivity for characterization of thin optical layers on transparent substrates
Bertin F, Chabli A, Chiariglione E, Burdin M, Berger M, Boudet T, Lartigue O, Ravel G
Thin Solid Films, 313-314, 68, 1998