검색결과 : 2건
No. | Article |
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1 |
Hyper high numerical aperature achromatic interferometer for immersion lithography at 193 nm Charley AL, Lagrange A, Lartigue O, Simon J, Thony P, Schiavone P Journal of Vacuum Science & Technology B, 23(6), 2668, 2005 |
2 |
Spectroscopic ellipsometry with compensator and X-ray specular reflectivity for characterization of thin optical layers on transparent substrates Bertin F, Chabli A, Chiariglione E, Burdin M, Berger M, Boudet T, Lartigue O, Ravel G Thin Solid Films, 313-314, 68, 1998 |