화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Study of high-temperature Smart Cut (TM): Application to silicon-on-sapphire films and to thin foils of single crystal silicon
Meyer R, Kononchuck O, Moriceau H, Lemiti M, Bruel M
Solid-State Electronics, 115, 225, 2016
2 Low Temperature Annealing with Solid-State Laser or UV Lamp Irradiation on Amorphous IGZO Thin-Film Transistors
Zan HW, Chen WT, Chou CW, Tsai CC, Huang CN, Hsueh HW
Electrochemical and Solid State Letters, 13(5), H144, 2010
3 High Quality SiO2 Deposited at 80 degrees C by Inductively Coupled Plasma Enhanced CVD for Flexible Display Application
Chen T, Ishihara R, Beenakker K
Electrochemical and Solid State Letters, 13(8), J89, 2010
4 Effects of Excimer Laser Annealing Process on the Ni-Sputtered Amorphous Silicon Film
Kim M, Jin G, Min H, Chung H, Kim S, Song J
Electrochemical and Solid State Letters, 13(10), H346, 2010
5 Study of submelt laser induced junction nonuniformities using Therma-Probe
Rosseel E, Bogdanowicz J, Clarysse T, Vandervorst W, Ortolland C, Hoffmann T, Salnik A, Nicolaides L, Han SH, Petersen DH, Lin R, Hansen O
Journal of Vacuum Science & Technology B, 28(1), C1C21, 2010
6 Submillisecond post-exposure bake of chemically amplified resists by CO2 laser spike annealing
Sha J, Jung B, Thompson MO, Ober CK, Chandhok M, Younkin TR
Journal of Vacuum Science & Technology B, 27(6), 3020, 2009
7 Pulsed laser techniques for nanographoepitaxy
Crnogorac F, Witte DJ, Pease RFW
Journal of Vacuum Science & Technology B, 26(6), 2520, 2008
8 Densification and crystallization of SnO2 : Sb sol-gel films using excimer laser annealing
Sandu CS, Teodorescu VS, Ghica C, Canut B, Blanchin MG, Roger JA, Brioude A, Bret T, Hoffmann P, Garapon C
Applied Surface Science, 208, 382, 2003