화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 GeS2 and GeSe2 PECVD from GeCl4 and Various Chalcogenide Precursors
Whitham PJ, Strommen DP, Lundell S, Lau LD, Rodriguez R
Plasma Chemistry and Plasma Processing, 34(4), 755, 2014
2 Thin Film Growth of Germanium Selenides from PECVD of GeCl4 and Dimethyl Selenide
Whitham PJ, Strommen DP, Lau LD, Rodriguez RG
Plasma Chemistry and Plasma Processing, 31(2), 251, 2011
3 Pulsed-spray radiofrequency plasma enhanced chemical vapor deposition of CuInS2 thin films
Rodriguez RG, Pulsipher DJV, Lau LD, Shurdha E, Pak JJ, Jin MH, Banger KK, Hepp AF
Plasma Chemistry and Plasma Processing, 26(2), 137, 2006
4 Effect of showerhead configuration on coherent Raman spectroscopically monitored pulsed radio frequency plasma enhanced chemical vapor deposited silicon nitride thin films
Phillips B, Rodriguez RG, Lau LD, Steidley SD
Plasma Chemistry and Plasma Processing, 24(2), 307, 2004