화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 High density plasma via hole etching in SiC
Cho H, Lee KP, Leerungnawarat P, Chu SNG, Ren F, Pearton SJ, Zetterling CM
Journal of Vacuum Science & Technology A, 19(4), 1878, 2001
2 Surface morphology and removal rates for dry- and wet-etched novel resonator materials Part I. La3Ga5.5Ta0.5O14
Hays DC, Leerungnawarat P, Pearton SJ, Archibald G, Smythe RC
Applied Surface Science, 165(2-3), 127, 2000
3 Surface morphology and removal rates for dry- and wet-etched novel resonator materials - Part II. La3Ga5.5Nb0.5O14
Hays DC, Leerungnawarat P, Pearton SJ, Archibald G, Smythe RC
Applied Surface Science, 165(2-3), 135, 2000
4 Via-hole etching for SiC
Leerungnawarat P, Hays DC, Cho H, Pearton SJ, Strong RM, Zetterling CM, Ostling M
Journal of Vacuum Science & Technology B, 17(5), 2050, 1999