화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Direct-Current Sputter-Deposition of Titanium Nitride Controlled in-Situ by Soft-X-Ray Emission-Spectroscopy
Legrand PB, Dauchot JP, Hecq M, Charbonnier M, Romand M
Journal of Vacuum Science & Technology A, 12(4), 1551, 1994
2 In-Situ Monitoring by Soft-X-Ray Spectrometry of Amorphous-Carbon Plasma Deposition
Legrand PB, Dauchot JP, Hecq M
Thin Solid Films, 241(1-2), 260, 1994
3 Optical-Properties of Sputter-Deposited Aluminum Nitride Films on Silicon
Legrand PB, Wautelet M, Dugnoille B, Dauchot JP, Hecq M
Thin Solid Films, 248(2), 220, 1994