화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Hydrogen plasma etching mechanism at the a-C:H/a-SiCx:H interface: A key factor for a-C:H adhesion
Leidens LM, Crespi AE, Boeira CD, Echeverrigaray FG, Figueroa CA
Applied Surface Science, 455, 1179, 2018
2 A comprehensive study on different silicon-containing interlayers for a-C:H adhesion on ferrous alloys
Boeira CD, Leidens LM, Cemin F, Petry ER, da Costa MEHM, Camargo SS, Michels AF, Figueroa CA
Thin Solid Films, 645, 351, 2018