검색결과 : 2건
No. | Article |
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1 |
Hydrogen plasma etching mechanism at the a-C:H/a-SiCx:H interface: A key factor for a-C:H adhesion Leidens LM, Crespi AE, Boeira CD, Echeverrigaray FG, Figueroa CA Applied Surface Science, 455, 1179, 2018 |
2 |
A comprehensive study on different silicon-containing interlayers for a-C:H adhesion on ferrous alloys Boeira CD, Leidens LM, Cemin F, Petry ER, da Costa MEHM, Camargo SS, Michels AF, Figueroa CA Thin Solid Films, 645, 351, 2018 |