화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Atomic layer deposition of TaSix, thin films on SiO2 using TaF5 and Si2H6
Lemonds AM, Bolom T, Ahearn WJ, Gay DC, White JM, Ekerdt JG
Thin Solid Films, 488(1-2), 9, 2005
2 Characterization of and imprint results using indium tin oxide-based step and flash imprint lithography templates
Dauksher WJ, Nordquist KJ, Mancini DP, Resnick DJ, Baker JH, Hooper AE, Talin AA, Bailey TC, Lemonds AM, Sreenivasan SV, Ekerdt JG, Willson CG
Journal of Vacuum Science & Technology B, 20(6), 2857, 2002
3 Low temperature chemical vapor deposition of tungsten carbide for copper diffusion barriers
Sun YM, Lee SY, Lemonds AM, Engbrecht ER, Veldman S, Lozano J, White JM, Ekerdt JG, Emesh I, Pfeifer K
Thin Solid Films, 397(1-2), 109, 2001