화학공학소재연구정보센터
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No. Article
1 Atomic Layer Deposition of Hafnium Silicate Thin Films Using Tetrakis(diethylamido)hafnium and Tris(2-methyl-2-butoxy)silanol
Liu J, Lennard WN, Goncharova LV, Landheer D, Wu XH, Rushworth SA, Jones AC
Journal of the Electrochemical Society, 156(8), G89, 2009
2 Range of Er ions in amorphous Si
Liu J, Lennard WN, Lee JK
Applied Surface Science, 253(2), 937, 2006
3 Depth profiling of ultrathin films using medium energy ion scattering
Kim J, Lennard WN, McNorgan CP, Hendriks J, Mitchell IV, Landheer D, Gredley J
Current Applied Physics, 3(1), 75, 2003
4 Ultrathin zirconium silicate films deposited on Si(100) using Zr(O-i-Pr)(2)(thd)(2), Si(O-t-Bu)(2)(thd)(2), and nitric oxide
Chen HW, Huang TY, Landheer D, Wu X, Moisa S, Sproule GI, Kim JK, Lennard WN, Chao TS
Journal of the Electrochemical Society, 150(7), C465, 2003
5 Interfacial layer formation in Gd2O3 films deposited directly on Si(001)
Gupta JA, Landheer D, Sproule GI, McCaffrey JP, Graham MJ, Yang KC, Lu ZH, Lennard WN
Applied Surface Science, 173(3-4), 318, 2001
6 Characterization of Gd2O3 films deposited on Si(100) by electron-beam evaporation
Landheer D, Gupta JA, Sproule GI, McCaffrey JP, Graham MJ, Yang KC, Lu ZH, Lennard WN
Journal of the Electrochemical Society, 148(2), G29, 2001
7 Analysis of silicon-oxide-silicon nitride stacks by medium-energy ion scattering
Ladheer D, Ma P, Lennard WN, Mitchell IV, McNorgan C
Journal of Vacuum Science & Technology A, 18(5), 2503, 2000
8 Characterization of Carbon and Carbon Nitride Thin-Films Using Time-of-Flight Secondary-Ion Mass-Spectrometry
Huang LJ, Hung Y, Chang S, Massoumi GR, Lennard WN, Mitchell IV
Journal of Vacuum Science & Technology A, 15(4), 2196, 1997
9 Structure of the Sinx/GaAs (110) Interface Modified with Ultrathin Si and Sulfur Passivation
Huang LJ, Lau WM, Tang HT, Lennard WN, Mitchell IV, Landheer D, Baribeau JM, Ingrey S
Journal of Vacuum Science & Technology B, 14(4), 2895, 1996