| 1 |
One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers
Hirai T, Leolukman M, Liu CC, Han E, Kim YJ, Ishida Y, Hayakawa T, Kakimoto M, Nealey PF, Gopalan P
Advanced Materials, 21(43), 4334, 2009 |
| 2 |
Linear-Dendritic Block Copolymer Hosts for the Encapsulation of Electro-Optic Chromophores via H-Bonding
Leolukman M, Paoprasert P, Mandel I, Diaz SJ, Mcgee DJ, Gopalan P
Journal of Polymer Science Part A: Polymer Chemistry, 47(19), 5017, 2009 |
| 3 |
Perpendicular Orientation of Domains in Cylinder-Forming Block Copolymer Thick Films by Controlled Interfacial Interactions
Han E, Stuen KO, Leolukman M, Liu CC, Nealey PF, Gopalan P
Macromolecules, 42(13), 4896, 2009 |
| 4 |
Hierarchical Self-Assembled Structures from POSS-Containing Block Copolymers Synthesized by Living Anionic Polymerization
Hirai T, Leolukman M, Jin S, Goseki R, Ishida Y, Kakimoto MA, Hayakawa T, Ree M, Gopalan P
Macromolecules, 42(22), 8835, 2009 |
| 5 |
Hierarchical nanostructures of organosilicate nanosheets within self-organized block copolymer films
Hirai T, Leolukman M, Hayakawa T, Kakimoto M, Gopalan P
Macromolecules, 41(13), 4558, 2008 |
| 6 |
Influence of architecture, concentration, and thermal history on the poling of Nonlinear optical chromophores in block copolymer domains
Leolukman M, Paoprasert P, Wang Y, Makhija V, Mcgee DJ, Gopalan P
Macromolecules, 41(13), 4651, 2008 |
| 7 |
Pixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness
La YH, Park SM, Meagley RP, Leolukman M, Gopalan P, Nealey PF
Journal of Vacuum Science & Technology B, 25(6), 2508, 2007 |
| 8 |
Effect of rubbing-induced polymer chain alignment on adhesion and friction of glassy polystyrene surfaces
Leolukman M, Kim SH
Langmuir, 21(2), 682, 2005 |
