1 |
Outstanding memory characteristics with atomic layer deposited Ta2O5/Al2O3/TiO2/Al2O3/Ta2O5 nanocomposite structures as the charge trapping layer Han P, Lai TC, Wang M, Zhao XR, Cao YQ, Wu D, Li AD Applied Surface Science, 467, 423, 2019 |
2 |
Self-formed porous Ni(OH)(2) on Ni3S2/Ni foam during electrochemical cycling for high performance supercapacitor with ultrahigh areal capacitance Cao YQ, Qian X, Zhang W, Li M, Wang SS, Wu D, Li AD Electrochimica Acta, 303, 148, 2019 |
3 |
Growth Mechanism, Ambient Stability, and Charge Trapping Ability of Ti-Based Maleic Acid Hybrid Films by Molecular Layer Deposition Cao YQ, Zhang W, Xu LN, Liu C, Zhu L, Wang LG, Wu D, Li AD, Fang GY Langmuir, 35(8), 3020, 2019 |
4 |
Study on hot compressive deformation behaviors and corresponding industrial extrusion of as-homogenized Al-7.82Zn-1.96Mg-2.35Cu-0.11Zr alloy Wang WY, Pan QL, Sun YW, Wang XD, Li AD, Song WB Journal of Materials Science, 53(16), 11728, 2018 |
5 |
A comparative study of growth and properties of atomic layer deposited transparent conductive oxide of Al doped ZnO films from different Al precursors Li M, Qian X, Li AD, Cao YQ, Zhai HF, Wu D Thin Solid Films, 646, 126, 2018 |
6 |
Cultivation-dependent and high-throughput sequencing approaches studying the co-occurrence of antibiotic resistance genes in municipal sewage system Li AD, Ma LP, Jiang XT, Zhang T Applied Microbiology and Biotechnology, 101(22), 8197, 2017 |
7 |
ZnO/ZnS Core-Shell Nanowires Arrays on Ni Foam Prepared by Atomic Layer Deposition for High Performance Supercapacitors Cao YQ, Qian X, Zhang W, Wang SS, Li M, Wu D, Li AD Journal of the Electrochemical Society, 164(14), A3493, 2017 |
8 |
HfO2/GeOxNy/Ge gate stacks with sub-nanometer capacitance equivalent thickness and low interface trap density by in situ NH3 plasma pretreatment Cao YQ, Chen J, Liu XJ, Li X, Cao ZY, Ma YJ, Wu D, Li AD Applied Surface Science, 325, 13, 2015 |
9 |
Enhanced electrochemical performance of Li1.2Mn0.54Ni0.13Co0.13O2 by surface modification with graphene-like lithium-active MoS2 Kong JZ, Wang CL, Qian X, Tai GA, Li AD, Wu D, Li H, Zhou F, Yu C, Sun Y, Jia D, Tang WP Electrochimica Acta, 174, 542, 2015 |
10 |
Nonvolatile memory capacitors based on Al2O3 tunneling and HfO2 blocking layers with charge storage in atomic-layer-deposited Pt nanocrystals Liu XJ, Zhu L, Gao MY, Li XF, Cao ZY, Zhai HF, Li AD, Wu D Applied Surface Science, 289, 332, 2014 |