검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Inductively coupled, point-of-use plasma abatement of perfluorinated compounds and hydrofluorinated compounds from etch processes utilizing O-2 and H2O as additive gases Tonnis EJ, Graves DB, Vartanian VH, Beu L, Lii T, Jewett R Journal of Vacuum Science & Technology A, 18(2), 393, 2000 |
| 2 |
Investigation of Polyimide Residue Due to Reactive Ion Etching in O-2 Tsang YL, Miller C, Lii T Journal of the Electrochemical Society, 143(4), 1464, 1996 |
| 3 |
High-Performance Sub-0.1 Mu-M Silicon N-Metal Oxide Semiconductor Transistors with Composite Metal Polysilicon Gates Rishton SA, Mii YJ, Kern DP, Taur Y, Lee KY, Lii T, Jenkins K, Quinlan D, Brown T, Danner D, Sewell F, Polcari M Journal of Vacuum Science & Technology B, 11(6), 2612, 1993 |