화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process
Chappe JM, Martin N, Lintymer J, Sthal F, Terwagne G, Takadoum J
Applied Surface Science, 253(12), 5312, 2007
2 Substrate temperature and water vapour effects on structural and mechanical properties of TiOxNy coatings
Chappe JM, Gavoille J, Martin N, Lintymer J, Takadoum J
Journal of Materials Science, 41(17), 5639, 2006
3 Modeling of Young's modulus, hardness and stiffness of chromium zigzag multilayers sputter deposited
Lintymer J, Martin N, Chappe JM, Takadoum J, Delobelle P
Thin Solid Films, 503(1-2), 177, 2006
4 Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering
Chappe JM, Martin N, Pierson JF, Terwagne G, Lintymer J, Gavoille J, Takadoum J
Applied Surface Science, 225(1-4), 29, 2004
5 Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering
Chappe JM, Martin N, Terwagne G, Lintymer J, Gavoille J, Takadoum J
Thin Solid Films, 440(1-2), 66, 2003
6 Nitrogen pulsing to modify the properties of titanium nitride thin films sputter deposited
Martin N, Lintymer J, Gavoille J, Takadoum J
Journal of Materials Science, 37(20), 4327, 2002