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| No. | Article |
|---|---|
| 1 |
Deposition of Silicon Dioxide Films Using the Helicon Diffusion Reactor for Integrated-Optics Applications Giroultmatlakowski G, Charles C, Durandet A, Boswell RW, Armand S, Persing HM, Perry AJ, Lloyd PD, Hyde SR, Bogsanyi D Journal of Vacuum Science & Technology A, 12(5), 2754, 1994 |