화학공학소재연구정보센터
검색결과 : 15건
No. Article
1 Thermal imidization optimization of polyimide thin films using Fourier transform infrared spectroscopy and electrical measurements
Diaham S, Locatelli ML, Lebey T, Malec D
Thin Solid Films, 519(6), 1851, 2011
2 Characterization of polyimide dielectric layer for the passivation of high electric field and high temperature silicon carbide power devices
Zelmat S, Locatelli ML, Lebey T
Materials Science Forum, 483, 717, 2005
3 SiC-based current limiter devices
Chante JP, Tournier D, Planson D, Raynaud C, Lazar M, Locatelli ML, Brosselard P
Materials Science Forum, 457-460, 951, 2004
4 Characteristics of 6H-SiC bipolar JTE diodes realized by sublimation epitaxy and Al implantation
Strel'chuk AM, Lebedev AA, Davydov DV, Savkina NS, Kuznetsov AN, Valakh MY, Kiselev VS, Romanyuk BN, Raynaud C, Chante JP, Locatelli ML
Materials Science Forum, 457-460, 1133, 2004
5 A comparative study of high-temperature aluminum post-implantation annealing in 6H-and 4H-SiC, non-uniform temperature effects
Lazar M, Raynaud C, Planson D, Locatelli ML, Isoird K, Ottaviani L, Chante JP, Nipoti R, Poggi A, Cardinali G
Materials Science Forum, 389-3, 827, 2002
6 Study of 4H-SiC high-voltage bipolar diodes under reverse bias using electrical and OBIC characterization
Isoird K, Lazar M, Locatelli ML, Raynaud C, Planson D, Chante JP
Materials Science Forum, 389-3, 1289, 2002
7 Investigation of Al-implanted 6H-and 4H-SiC layers after fast heating rate annealings
Ottaviani L, Lazar M, Locatelli ML, Monteil Y, Heera V, Voelskow M, Skorupa W
Applied Surface Science, 184(1-4), 330, 2001
8 Experimental characterization of a 4H-SiC high voltage current limiting device
Nallet F, Planson D, Godignon P, Locatelli ML, Lazar M, Chante JP
Applied Surface Science, 184(1-4), 404, 2001
9 Study of 6H-SiC high voltage bipolar diodes under reverse biases
Isoird K, Lazar M, Ottaviani L, Locatelli ML, Raynaud C, Planson D, Chante JP
Applied Surface Science, 184(1-4), 477, 2001
10 High electrical activation of aluminium and nitrogen implanted in 6H-SiC at room temperature by RF annealing
Lazar M, Ottaviani L, Locatelli ML, Raynaud C, Planson D, Morvan E, Godignon P, Skorupa W, Chantel JP
Materials Science Forum, 353-356, 571, 2001