검색결과 : 1건
No. | Article |
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1 |
Effect of slurry components on chemical mechanical polishing of copper at low down pressure and a chemical kinetics model Liu XY, Liu YL, Liang Y, Liu HX, Zhao ZW, Gao BH Thin Solid Films, 520(1), 400, 2011 |
No. | Article |
---|---|
1 |
Effect of slurry components on chemical mechanical polishing of copper at low down pressure and a chemical kinetics model Liu XY, Liu YL, Liang Y, Liu HX, Zhao ZW, Gao BH Thin Solid Films, 520(1), 400, 2011 |