검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Dry etching of copper thin films in high density plasma of CH3COOH/Ar Ryu JS, Lim ET, Choi JS, Chung CW Thin Solid Films, 672, 55, 2019 |
| 2 |
Low-temperature amorphous boron nitride on Si0.7Ge0.3(001), Cu, and HOPG from sequential exposures of N2H4 and BCl3 Wolf S, Edmonds M, Sardashti K, Clemons M, Park JH, Yoshida N, Dong L, Nemani S, Yieh E, Holmes R, Alvarez D, Kummel AC Applied Surface Science, 439, 689, 2018 |
| 3 |
Etch characteristics of copper thin films in high density plasma of CH4/O-2/Ar gas mixture Lim ET, Ryu JS, Chung CW Thin Solid Films, 665, 51, 2018 |