검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Tantalum carbide etch characterization in inductively coupled Ar/Cl-2/HBr plasmas Kawai H, Rauf S, Luckowski E, Ventzek PLG Journal of Vacuum Science & Technology A, 24(5), 1764, 2006 |
| 2 |
Fermi level pinning and Schottky barrier characteristics on reactively ion etched 4H-SiC Skromme BJ, Luckowski E, Moore K, Clemens S, Resnick D, Gehoski T, Ganser D Materials Science Forum, 338-3, 1029, 2000 |
| 3 |
Control of Etch Pit Density in Low-Pressure-Grown 3C-SiC/Si by Variation of Reactor Pressure Tin CC, Hu R, Park J, Isaacssmith TF, Luckowski E Journal of Materials Science Letters, 15(9), 823, 1996 |