화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 Simulation and characterization on properties of AlN films for SOI application
Song ZR, Yu YH, Zou SC, Zheng ZH, Shen DS, Luo EZ, Xie Z, Sundaravel B, Wong SP, Wilson IH
Thin Solid Films, 459(1-2), 41, 2004
2 Electrical properties and microstructure of buried oxide (BOX) of SIMOX studied by Conducting Atomic Force Microscopy (C-AFM)
Song ZR, Chen KW, Yu YH, Luo EZ, Shen DS
Thin Solid Films, 459(1-2), 58, 2004
3 Nanoscale investigation on nature of dark hole in moisture-exposed tris(8-hydroxyquinoline) aluminum thin films
Xu MS, Xu JB, Luo EZ, Xie Z
Chemical Physics Letters, 374(5-6), 656, 2003
4 Characterization of nano-sized Si islands in buried oxide layer of SIMOX by Conducting AFM
Chen KW, Yu YH, Luo EZ, Xie Z, Xu JB, Wilson IH, Bishop WY, Shen DS
Chemical Physics Letters, 376(5-6), 748, 2003
5 Photo-stimulated current spectroscopy and its application in detecting aluminum implantation-induced deep traps in GaN
Xu XL, He HY, Liu HT, Shi CS, Ge WK, Luo EZ, Sundaravel B, Wilson IH
Thin Solid Films, 416(1-2), 294, 2002
6 Non-Rutherford backscattering studies of SiC/SIMOX structures
Chen KW, Yu YH, Lei YM, Cheng LL, Sundaraval B, Luo EZ, Wong SP, Wilson IH, Chen LZ, Ren CX, Zou SC
Applied Surface Science, 184(1-4), 178, 2001
7 Structural and optical properties of SiC films deposited on Si by DG magnetron sputtering
Lei YM, Yu YH, Cheng LL, Lin L, Sundaraval B, Luo EZ, Lin S, Ren CX, Cheung WY, Wong SP, Xu JB, Zou SC, Wilson IH
Materials Science Forum, 353-356, 191, 2001
8 Ti, TiN, and Ti/TiN thin films prepared by ion beam assisted deposition as diffusion barriers between Cu and Si
Mu HC, Yu YH, Luo EZ, Sundaravel B, Wong SP, Wilson IH
Journal of Vacuum Science & Technology A, 18(5), 2312, 2000
9 Effects of deposition conditions on the fluorine and hydrogen concentration in tantalum pentoxide (Ta2O5) thin films prepared by plasma enhanced chemical vapor deposition using a tantalum pentafluoride (TaF5) source
Luo EZ, Sundaravel B, Guo HY, Wilson IH, Four S, Devine RAB
Journal of Vacuum Science & Technology A, 17(6), 3235, 1999
10 Electrical properties of nitrogen incorporated tetrahedral amorphous carbon films
Chen ZY, Yu YH, Zhao JP, Yang SQ, Shi TS, Liu XH, Luo EZ, Xu JB, Wilson IH
Thin Solid Films, 339(1-2), 74, 1999