| 1 |
MeSiCl3 functionalized polyamide thin film nanocomposite for low pressure RO membrane desalination
Shen HM, Wang SH, Li YH, Gu KF, Zhou Y, Gao CJ
Desalination, 463, 13, 2019 |
| 2 |
Thermodynamic design of a high temperature chemical vapor deposition process to synthesize alpha-SiC in Si-C-H and Si-C-H-Cl systems
Kang YR, Yoo CH, Nam DH, Lee MH, Seo WS, Hong S, Jeong SM
Journal of Crystal Growth, 485, 78, 2018 |
| 3 |
Study of Low-k Film Functionalization and Pore Sealing Using Chlorosilanes Dissolved in Supercritical Carbon Dioxide
Vyhmeister E, Reyes-Bozo L, Rodriguez-Maecker R, Muscat A, Suleiman D, Estevez LA
Chemical Engineering Communications, 203(7), 880, 2016 |
| 4 |
[BMIM]Cl-nAlCl3 ionic liquid-catalyzed redistribution reaction between methyltrichlorosilane and low-boiling residue to dimethyldichlorosilane
Wang A, Jiang Y, Chen W, Yin H, Liu Y, Shen Y, Jiang T, Wu Z
Journal of Industrial and Engineering Chemistry, 18(1), 237, 2012 |
| 5 |
An Analysis of Low Frequency Discharge in a CH3SiCl3-Ar-H-2 Mixture by Optical Emission Spectroscopy and Actinometry
Kulakowska-Pawlak B, Jamroz P
Plasma Chemistry and Plasma Processing, 30(5), 641, 2010 |
| 6 |
Superhydrophobicity of polyvinylidene fluoride membrane fabricated by chemical vapor deposition from solution
Zheng ZR, Gu ZY, Huo RT, Ye YH
Applied Surface Science, 255(16), 7263, 2009 |
| 7 |
High-pressure phase equilibria for chlorosilane plus carbon dioxide mixtures
Vymeister E, Muscat AJ, Suleiman D, Estevez LA
Fluid Phase Equilibria, 270(1-2), 121, 2008 |
| 8 |
Very high growth rate of 4H-SiC epilayers using the chlorinated precursor methyltrichlorosilane (MTS)
Pedersen H, Leone S, Henry A, Beyer FC, Darakchieva V, Janzen E
Journal of Crystal Growth, 307(2), 334, 2007 |
| 9 |
Isobaric vapor-liquid equilibrium for methyltrichlorosilane-dimethyldichlorosilane-benzene system
Qiu ZM, Xie XL, He YB, Xie FX, Wu QF, Ding YP
Fluid Phase Equilibria, 242(2), 118, 2006 |
| 10 |
Peculiarities of preparing a-SiC : H films from methyltrichlorosilane
Rusakov GV, Ivashchenko LA, Ivashchenko VI, Porada OK
Applied Surface Science, 184(1-4), 128, 2001 |
