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Effects of a Short Physical Exercise Intervention on Patients with Multiple Sclerosis (MS) Kerling A, Keweloh K, Tegtbur U, Kuck M, Grams L, Horstmann H, Windhagen A International Journal of Molecular Sciences, 16(7), 15761, 2015 |
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Multilevel metal/Pb(Zr0.52Ti0.48)O-3/TiOxNy/Si for next generation FeRAM technology node Sharma DK, Khosla R, Sharma SK Solid-State Electronics, 111, 42, 2015 |
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Use of negative capacitance to simulate the electrical characteristics in double-gate ferroelectric field-effect transistors Xiao YG, Tang MH, Xiong Y, Li JC, Cheng CP, Jiang B, Cai HQ, Tang ZH, Lv XS, Gu XC, Zhou YC Current Applied Physics, 12(6), 1591, 2012 |
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Factors for the polarization lifetime in metal-ferroelectric-insulator-semiconductor capacitors Xiao YG, Xiong Y, Tang MH, Li JC, Gu XC, Cheng CP, Jiang B, Tang ZH, Lv XS, Cai HQ, He J Solid-State Electronics, 73, 84, 2012 |
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Electrical characteristics of Si MFIS-FETs using P(VDF-TrFE) thin films Yoon JW, Yoon SM, Ishiwara H Current Applied Physics, 11(3), S225, 2011 |
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Electrical properties of metal-ferroelectric-insulator-semiconductor structure using BaxSr1-xTiO3 for ferroelectric-gate field effect transistor Saif AA, Poopalan P Solid-State Electronics, 62(1), 25, 2011 |
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Al/Pb(Zr0.53Ti0.47)O-3/Polycrystalline Silicon/Insulator (Y2O3)/Si Field Effect Transistors for Nonvolatile Memory Applications Chan PC, Chang IYK, Juan PC, Lee JYM Electrochemical and Solid State Letters, 13(3), H73, 2010 |
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The Ferroelectric and Charge Injection Effects of Metal-Ferroelectric (BiFe0.95Mn0.05O3)-Insulator (Bi2Ti2O7)-Silicon Capacitors Yang CH, Hu GD, Wu WB, Wang JC, Wang X Electrochemical and Solid State Letters, 13(5), G43, 2010 |
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Low Voltage Operation of Nonvolatile Ferroelectric Capacitors Using Poly(vinylidene fluoride-trifluoroethylene) Copolymer and Thin Al2O3 Insulating Layer Jung SW, Yoon SM, Kang SY, Choi KJ, Shin WC, Yu BG Electrochemical and Solid State Letters, 12(9), H325, 2009 |
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Electrical properties of metal-ferroelectric (PbZr0.53Ti0.47O3)-polysilicon-insulator (Y2O3)-silicon capacitors and field-effect transistors Chan PC, Shih WC, Chang IYK, Lee JYM Journal of Vacuum Science & Technology B, 27(3), 1026, 2009 |