화학공학소재연구정보센터
검색결과 : 31건
No. Article
1 Effect of the cluster size in modeling the H-2 desorption and dissociative adsorption on Si(001)
Penev E, Kratzer P, Scheffler M
Journal of Chemical Physics, 110(8), 3986, 1999
2 Heterogeneous recombination of atomic bromine and fluorine
Kota GP, Coburn JW, Graves DB
Journal of Vacuum Science & Technology A, 17(1), 282, 1999
3 Abstraction of chemisorbed bromine from the Si(111) surface by incident hydrogen atoms
McEllistrem M, Buehler EJ, Itchkawitz BS, Boland JJ
Journal of Chemical Physics, 108(17), 7384, 1998
4 The kinetics of the low-pressure chemical vapor deposition of polycrystalline silicon from silane
Weerts WLM, de Croon MHJM, Marin GB
Journal of the Electrochemical Society, 145(4), 1318, 1998
5 The recombination of chlorine atoms at surfaces
Kota GP, Coburn JW, Graves DB
Journal of Vacuum Science & Technology A, 16(1), 270, 1998
6 Desorption rate of surface hydrogen in SiGe gas-source molecular beam epitaxy using Si2H6 and GeH4
Hirose F, Sakamoto H
Journal of Vacuum Science & Technology A, 16(5), 2974, 1998
7 P-2 desorption from phosphine decomposition on Si(100) surfaces
Jacobson ML, Chiu MC, Crowell JE
Langmuir, 14(6), 1428, 1998
8 Reaction Dynamics of Atomic-Hydrogen with the Hydrogenated Si(001) (2X1) Surface
Kratzer P
Journal of Chemical Physics, 106(16), 6752, 1997
9 Hydrogen Desorption from Ion-Roughened Si(100)
Hess G, Russell M, Gong B, Parkinson P, Ekerdt JG
Journal of Vacuum Science & Technology A, 15(3), 1129, 1997
10 Migration-Assisted Si Subatomic-Layer Epitaxy from Si2H6
Suda Y
Journal of Vacuum Science & Technology A, 15(5), 2463, 1997