검색결과 : 2건
No. | Article |
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1 |
Dopant diffusion modeling for heteroepitaxial SiGe/Si devices Chakravarthi S, Chidambaram PR, Machala CF, Mansoori M Journal of Vacuum Science & Technology B, 24(2), 608, 2006 |
2 |
High-resolution two-dimensional dopant characterization using secondary ion mass spectrometry Ukraintsev VA, Chen PJ, Gray JT, Machala CF, Magel LK, Chang MC Journal of Vacuum Science & Technology B, 18(1), 580, 2000 |