| 1 |
Atomic radical abatement of organic impurities from electron beam deposited metallic structures
Wnuk JD, Gorham JM, Rosenberg SG, Madey TE, Hagen CW, Fairbrother DH
Journal of Vacuum Science & Technology B, 28(3), 527, 2010 |
| 2 |
Oxygen induced facet formation on Rh(210) surface
Govind, Chen WH, Wang H, Madey TE
Applied Surface Science, 256(2), 371, 2009 |
| 3 |
Preferential Nucleation of Metallic Clusters on a Nanotemplate: Co on Oxygen-Faceted Re(12(3)over-bar1)
Reyhan M, Wang H, Madey TE
Catalysis Letters, 129(1-2), 46, 2009 |
| 4 |
Interaction of benzene with TiO2 surfaces: Relevance to contamination of extreme ultraviolet lithography mirror capping layers
Zalkind S, Yakshinskiy BV, Madey TE
Journal of Vacuum Science & Technology B, 26(6), 2241, 2008 |
| 5 |
The reactions of water vapour on the surfaces of stoichiometric and reduced uranium dioxide: A high resolution XPS study
Senanayake SD, Waterhouse GIN, Chan ASY, Madey TE, Mullins DR, Idriss H
Catalysis Today, 120(2), 151, 2007 |
| 6 |
Low-energy electron-induced processes in fluorinated copper phthalocyanine films observed by F- desorption: Why so little damage
Menzel D, Cloutier P, Sanche L, Madey TE
Journal of Physical Chemistry A, 111(49), 12427, 2007 |
| 7 |
Resonances in electron stimulated desorption yield of cesium atoms from germanium monolayer-covered tungsten
Ageev VN, Kuznetsov YA, Madey TE
Journal of Vacuum Science & Technology A, 25(4), 731, 2007 |
| 8 |
Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography
Madey TE, Faradzhev NS, Yakshinskiy BV, Edwards NV
Applied Surface Science, 253(4), 1691, 2006 |
| 9 |
Structure sensitivity in the oxidation of CO on Ir surfaces
Chen WH, Ermanoski I, Jacob T, Madey TE
Langmuir, 22(7), 3166, 2006 |
| 10 |
Stability of water monolayers on Ru(0001): Thermal and electronically induced dissociation
Faradzhev NS, Kostov KL, Feulner P, Madey TE, Menzel D
Chemical Physics Letters, 415(1-3), 165, 2005 |
